238000004544 sputter deposition Methods 0.000 description 1.229910052759 nickel Inorganic materials 0.000 description 1.238000006011 modification reaction Methods 0.000 description 1.230000005540 biological transmission Effects 0.000 description 1.XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1.229910052782 aluminium Inorganic materials 0.000 description 1.230000003746 surface roughness Effects 0.000 description 2.PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2.229910052751 metal Inorganic materials 0.000 description 2. 238000004519 manufacturing process Methods 0.000 description 2.238000006243 chemical reaction Methods 0.000 description 3.238000005755 formation reaction Methods 0.000 description 4.230000015572 biosynthetic process Effects 0.000 description 4.230000002093 peripheral Effects 0.000 claims description 2.Priority to JP2015191526A priority Critical patent/JP6598297B2/en Publication of JP2017067933A publication Critical patent/JP2017067933A/en Application granted granted Critical Publication of JP6598297B2 publication Critical patent/JP6598297B2/en Status Active legal-status Critical Current Anticipated expiration legal-status Critical Links filed Critical PARITY INNOVATIONS CO., LTD. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Application filed by PARITY INNOVATIONS CO., LTD. Priority date (The priority date is an assumption and is not a legal conclusion. Original Assignee PARITY INNOVATIONS CO., LTD. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) ( en Inventor 聡 前川 シャンドル マルコン Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) Active Application number JP2015191526A Other languages Japanese ( ja)
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